On-Wafer Device Characterization Including Uncertainty Estimates to 1.0 THz
공공데이터포털
data published in paper "On-Wafer Device Characterization Including Uncertainty Estimates to 1.0 THz"This dataset contains the calibrated scattering parameters (S-parameters) of a thru that was not used in calibration, and the simulated and calibrated S-parameters for series and shunt capacitors for both technology 1 and technology 2. It also contains the simulated and extracted capacitance from these S-parameters of the series and shunt capacitors. It contains the simulated and extracted capacitance for the shunt capacitor from one site in technology 1 and 95% prediction intervals (uncertainties) from electronic variation in the vector network analyzer (VNA), probe placement error, and the capacitance per unit length correction variation. Finally, it contains the extracted capacitance for multiple sites for the shunt capacitor in technology 1. All simulated S-parameters obtained using a 2.5D method of moments commercial solver. Simulated capacitance obtained from the simulated S-parameters.
On-Wafer Device Characterization Including Uncertainty Estimates to 1.0 THz
공공데이터포털
data published in paper "On-Wafer Device Characterization Including Uncertainty Estimates to 1.0 THz"This dataset contains the calibrated scattering parameters (S-parameters) of a thru that was not used in calibration, and the simulated and calibrated S-parameters for series and shunt capacitors for both technology 1 and technology 2. It also contains the simulated and extracted capacitance from these S-parameters of the series and shunt capacitors. It contains the simulated and extracted capacitance for the shunt capacitor from one site in technology 1 and 95% prediction intervals (uncertainties) from electronic variation in the vector network analyzer (VNA), probe placement error, and the capacitance per unit length correction variation. Finally, it contains the extracted capacitance for multiple sites for the shunt capacitor in technology 1. All simulated S-parameters obtained using a 2.5D method of moments commercial solver. Simulated capacitance obtained from the simulated S-parameters.
Electromagnetic Interference Measurements from Tungsten Inert Gas (TIG) Arc Welding
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The 2.4 GHz ISM band is shared by Wi-Fi, Bluetooth, Wireless HART, ISA100.11a, and several other industrial wireless systems. Our dataset contains comprehensive electromagnetic interference (EMI) measurements from TIG welding processes conducted in the NIST fabrication shop. The measurements were taken using a typical arc welding power source and recorded at three distinct frequencies: 900 MHz, 2.4 GHz, and 5.3 GHz. The data collection was performed with a bandwidth of 160 MHz and a sample rate of 625 MHz, providing high-resolution insights into the EMI characteristics during the welding operations. This dataset may be useful for understanding the EMI behavior in TIG welding and can be instrumental in developing interference mitigation strategies, aiding in RF band selection and frequency planning, and improving welding technology and regulations.Disclaimer: Certain commercial equipment, instruments, or materials are identified in this publication in order to describe the experimental procedures and data adequately. Such identification is not intended to imply recommendation or endorsement by the National Institute of Standards and Technology, nor is it intended to imply that the materials or equipment identified are necessarily the best available for the purpose.
Radio Frequency Interference Measurements of Industrial Machinery
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The 2.4 GHz ISM band is shared by Wi-Fi, Bluetooth, Wireless HART, ISA100.11a, and several other industrial wireless systems. Our dataset contains comprehensive electromagnetic interference (EMI) measurements from machinery taken in various industrial environments. The measurements were taken at two frequencies: 900 MHz, 2.4 GHz. This dataset may be useful for understanding EMI emitters in factories and can be instrumental in developing interference mitigation strategies, aiding in RF band selection and enterprise frequency planning, improving wireless technology, and informing communications standardization activities such as the IEEE 3388 industrial wireless performance evaluation standard.The interference measurements were taken in the following types of industrial environments:1) Infrared Curing Machine: Curing process using infrared radiation producing EMI across the 2.4 GHz band, 2) Crane with an Unshielded VFD: Overhead gantry crane operating at 900 MHz with an unshielded variable frequency drive (VFD) causing broadband interference, 3) Microwave Dryer: Two independent sets of measurements of a microwave oven baking machines used for a ceramic drying process. Multiple magnetrons are used with a power output of 1100 Watts each, 4) Unidentified Interference: General recording of the 2400 MHz band capturing both wireless network traffic and an unidentified broadband RFI emitter possibly caused by an unshielded VFD.NIST Disclaimer: Certain commercial equipment, instruments, or materials are identified in this publication in order to describe the experimental procedures and data adequately. Such identification is not intended to imply recommendation or endorsement by the National Institute of Standards and Technology, nor is it intended to imply that the materials or equipment identified are necessarily the best available for the purpose.